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China Rare Metal Material Co., Limited

Showing 1 - 9 of 9, total 1 pages        [First] [Previous] [Next] [Last]

1
zinc indium gallium oxide target(igzo)
zinc indium gallium oxide target(igzo)
Specification: In2O3:Ga2O3:ZnO=1:1:2 at%,99.99%min
Detail: In2O3:Ga2O3:ZnO=1:1:2 at%,99.99%min We with high quality and competitive price and always welcome your inquires.

2
lead tellurium evaporation material(pbte)
lead tellurium evaporation material(pbte)
Specification: PbTeï¼?9.999%min
Detail: Lead Tellruium Alloy (PbTe) Purity--- Pb-Te 95/5 Shape--- ingot we with the competitive price and high quality and always welcome your inquires.

3
lead sulfide sputtering target(pbs)
lead sulfide sputtering target(pbs)
Specification: PbS, 99.999%min
Detail: Lead Sulfide target(PbS), 99.999%min we with competitive price and high quality and always welcome your inquires.Looking forward for your cooperation.

4
titanium dioxide sputtering target(tio2)
titanium dioxide sputtering target(tio2)
Specification: TiO2, 99.99%min
Detail: Titanium Dioxide target(TiO2), 99.99%min, we with the competitive price and high quality and always welcome your inquires looking forward your cooperation.

5
silver copper (agcu) sputtering target
silver copper (agcu) sputtering target
Specification: AgCu, 99.99%min
Detail: Silver Copper (AgCu) Sputtering Targets Purity --- 99.99% Shape --- Discs, Plate, Step (Dia �00mm,, Thickness �mm) Rectangle, Sheet, Step (Length �00mm, Width �00mm, Thickness �mm) ...

6
barium titanate sputtering target(batio3)
barium titanate sputtering target(batio3)
Specification: BaTiO3
Detail: Barium Titanate Sputtering target - BaTiO3 target Purity --- 99.8%,99.95% Shape --- Disk, Plate, Plate, Sheet, Rod, Taper Application - Media, TFR, Thin film capacitor Barium Titanate Evaporation Material - BaT...

7
molybdenum sulfide (mos2) sputtering target
molybdenum sulfide (mos2) sputtering target
Specification: MoS2,99.9%min
Detail: Molybdenum Sulfide (MoS2) target 99.9%min, we with competitive and high quality, for more ***ails your can browse our website and always welcome your inquires.

8
si90al10wt% sputtering target
si90al10wt% sputtering target
Specification: Si90Al10wt%,99.9%min
Detail: Si90Al10wt% sputtering target (silicon aluminum sputtering target) purity 99.9%min produce way: HIP(hot isostatic pressing) max size: 950mm length x280mm width RD 98% we with competitive price and high quality and alwa...

9
aluminum neodymiun(alnd) alloy target
aluminum neodymiun(alnd) alloy target
Specification: Al(98)Nd(2)wt%, 99.99%min
Detail: Aluminum Neodymiun(AlNd) alloy target 99.99%, we with competitive price and high quality. Always welcome your inquiries and look forward for your cooperation.
Showing 1 - 9 of 9, total 1 pages        [First] [Previous] [Next] [Last]
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